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Leading Edge Technologies
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Meeting the changing needs of foundry customers is of foremost importance in the rapidly evolving world of semiconductors. In preparation for the trend towards 90 nanometer (nm) on 300-millimeter (mm) wafers, Chartered Semiconductor Manufacturing and IBM signed a joint development and manufacturing agreement in November 2002. Their shared goal: provide customers with a new choice for leading-edge semiconductor technology and sourcing flexibility. Sharing not only cost, but ideas and experience as well, this multi-company synergy provides customers with access to innovation and the power to better manage design and market risk.
For two years, the companies have been jointly developing
and aligning on 90nm and 65nm logic processes for production
on 300mm silicon wafers. Both companies realized early that
the fastest and most efficient plan was one of true partnership.
Working together with third-party providers of design tools
and open standards formats, Chartered and IBM are assisting
foundry customers in designing with these technologies, with
the goal of helping them to more easily move their products
between the two companies for production.
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Chartered-IBM Common Platform: What it all means
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- Freedom from proprietary lock-in
- Access to rich and stable development environment
- Collaborative community based model
- Increased leverage through joint marketing/development
- Expanded market opportunity
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Accelerating the move to the 65nm semiconductor
manufacturing process, Infineon Technologies AG joined Chartered
and IBM in their technology alliance in August 2003. The engagement
closely aligns Infineon's low-power silicon expertise with IBM's
leading process technology and Chartered's efforts to drive
a common foundry process platform that scales from 90nm through
next-generation 65nm technology and provides a path to 45nm.
Samsung joined the elite group at 65nm in March 2004, bringing
its consumer expertise to the joint development efforts.
Chartered, IBM, Infineon and Samsung are jointly developing
a common advanced foundry process at 65nm, as well as variants
tuned for high performance and low power. The companies are
also exploring extensions to 45nm technology. To assist foundry
customers in designing with these technologies, the companies
have also agreed to work together with third-party providers
to provide a robust ecosystem of optimized design tools.
The Chartered-IBM alliance was extended in January 2004 when IBM and Chartered announced that Chartered will manufacture selected 90nm SOI products for IBM in volume-driven, high-performance solutions.
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New Foundry Model
Exact same GDSII for Multi-Sourcing
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Common process/design platform ensures multi-source
- Maximum multi-sourcing flexibility
- Significant innovation in design solution
- Extensive design solution offering
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Setting a New Standard
In March 2004, IBM and Chartered announced plans to form the industry's first cross-foundry design enablement program to support leading-edge chip development with their jointly developed process platform, starting at the 90nm technology node.
This effort ensures the ultimate in foundry compatibility, design
portability and flexible sourcing across multiple suppliers
of leading-edge production capacity. The program reduces the
risks and costs customers typically encounter when designing
chips targeted for manufacturing with advanced nanometer-scale
technologies.
IBM and Chartered have already begun collaborating to expand the ecosystem of design technology and service providers with offerings pre-qualified for the IBM-Chartered 90nm silicon process platform. The first key milestone was shared library support with the leading suppliers of baseline libraries announced by Artisan Components, Inc. and Virage Logic Corporation.
In May 2004, the platform added further support from leading design solutions suppliers with the addition of nanometer-scale design libraries, electronic design automation (EDA) tools and standard foundry reference flows from Cadence Design Systems, Magma Design Automation, Mentor Graphics Corporation, and Synopsys.
Cadence, Magma, Mentor, and Synopsys have worked closely with
IBM and Chartered to characterize their design technologies,
pre-verify design data and validate tool flows that can help
lower the customer risk and cost associated with adopting the
90nm process, as well as streamline the ability to seamlessly
move between the two foundries.
90nm technology will be in demand everywhere-from simple toys and consumer electronics to meeting the expanding business needs of a growing global economy. The Chartered-IBM process platform provides a full solution, empowering customers to plan for, address and manage tomorrow's design challenges today.
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Additional Information:
Recent Press Releases
- 90 nanometer
- October 25, 2005
IBM Delivers Power-based Chip for Microsoft Xbox 360 Worldwide Launch
- May 25, 2005
IBM, Chartered Extend 90-Nanometer Common Platform with Low-Power Design Solutions, High-Speed Connectivity Cores
- May 25, 2005
IBM, Chartered Offer ARM Artisan Low-Power IP and High-Speed Phys for 90-Nanometer Common Platform
- May 25, 2005
Synopsys Provides Low-Power Reference Flow for IBM-Chartered 90-Nanometer Process Platform
- May 25, 2005
IBM, Chartered Select Synopsys' Hi-Speed USB 2.0 and OTG Phys for Their 90-nm Process Platform
- May 25, 2005
Magma Develops Low-Power Reference Flow for IBM-Chartered 90-Nanometer Process Platform
- May 25, 2005
Cadence, IBM, Chartered Continue Collaboration to Enable 90-Nanometer Design Success
- May 24, 2005
Samsung Joins IBM and Chartered on 90-Nanometer Common Design Enablement Platform
- November 16, 2004
Magma Delivers Design Enablement Kit for IBM-Chartered 90-Nanometer Process Platform
- September 7, 2004
Chartered Launches 0.13-Micron, 0.11-Micron and 90-Nanometer Processes at 300-mm Fab
- May 24, 2004
IBM, Chartered Expand 90NM Joint Design Enablement Program, Enhance Foundry Compatibility with Key EDA Support for Process Technology
- March 29, 2004
Chartered and IBM to Couple Fab Processes
- March 24, 2004
IBM, Chartered Create Industry's First Cross-Foundry Design Enablement Program
- March 5, 2004
Samsung Joins IBM, Infineon, Chartered Alliance
- March 5, 2004
Samsung Electronics Joins IBM, Chartered, Infineon in Nanotech Research In E. Fishkill
- January 14, 2004
IBM and Chartered Extend Manufacturing Arrangement to Include 90nm SOI Semiconductors
- November 27, 2002
IBM and Chartered Reach Development and Sourcing Agreement
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